Issue 81, 2016, Issue in Progress
From the journal:

RSC Advances

Site-selective growth of metal–organic frameworks using an interfacial growth approach combined with VUV photolithography†

Takaaki Tsuruoka,*a   Tetsuhiro Matsuyama,a   Ayumi Miyanaga,a   Takashi Ohhashi,a   Yohei Takashimaa  and  Kensuke Akamatsu*a  

* Corresponding authors

a Department of Nanobiochemistry, Frontiers of Innovative Research in Science and Technology (FIRST), Konan University, 7-1-20 Minatojimaminami, Chuo-ku, Kobe 650-0047, Japan
E-mail: tsuruoka@center.konan-u.ac.jp, akamatsu@center.konan-u.ac.jp

Abstract

We report a unique method for the site-selective growth of metal–organic frameworks (MOFs). The site-selective growth of MOFs can be achieved by fabricating a pattern of polymer photoresist on the metal-ion-doped polymer substrate and then constructing frameworks by immersion in an organic ligand solution.

Graphical abstract: Site-selective growth of metal–organic frameworks using an interfacial growth approach combined with VUV photolithography

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Article information

DOI
https://doi.org/10.1039/C6RA18340A
Article type
Communication
Submitted
19 Jul 2016
Accepted
09 Aug 2016
First published
10 Aug 2016

RSC Adv., 2016,6, 77297-77300

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Site-selective growth of metal–organic frameworks using an interfacial growth approach combined with VUV photolithography

T. Tsuruoka, T. Matsuyama, A. Miyanaga, T. Ohhashi, Y. Takashima and K. Akamatsu, RSC Adv., 2016, 6, 77297 DOI: 10.1039/C6RA18340A

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