Optimizing PVD conditions for electrochemical anodization growth of well-adherent Ta2O5 nanotubes on Ti–6Al–4V alloy

Masoud Sarraf; Bushroa Abdul Razak; Ali Dabbagh; Bahman Nasiri-Tabrizi; Noor Hayaty Abu Kasim; Wan Jefrey Basirun

doi:10.1039/C6RA11290K

Optimizing PVD conditions for electrochemical anodization growth of well-adherent Ta₂O₅ nanotubes on Ti–6Al–4V alloy†

Masoud Sarraf,^ab Bushroa Abdul Razak,*^abc Ali Dabbagh,

^ad Bahman Nasiri-Tabrizi,*^e Noor Hayaty Abu Kasim^d and Wan Jefrey Basirun^f

Author affiliations

* Corresponding authors

^a Center of Advanced Manufacturing and Material Processing, Department of Engineering, University of Malaya, Kuala Lumpur 50603, Malaysia

^b Department of Mechanical Engineering, Faculty of Engineering, University of Malaya, 50603 Kuala Lumpur, Malaysia
E-mail: bushroa@um.edu.my
Fax: +60 379675330
Tel: +60 379675239

^c Department of Mechanical and Aerospace Engineering, University of California, CA 90095-1597, USA

^d Department of Restorative Dentistry, Faculty of Dentistry, University of Malaya, Kuala Lumpur, Malaysia

^e Advanced Materials Research Center, Materials Engineering Department, Najafabad Branch, Islamic Azad University, Najafabad, Isfahan, Iran
E-mail: bahman_nasiri@hotmail.com
Fax: +98 3142291016
Tel: +98 9132275822

^f Department of Chemistry, Faculty of Science, University of Malaya, 50603 Kuala Lumpur, Malaysia

Abstract

Well-adherent tantalum pentoxide nanotubes (Ta₂O₅ NTs) were successfully grown on Ti–6Al–4V alloy (Ti64) through optimization of physical vapor deposition magnetron sputtering (PVDMS) followed by a two-step anodization and subsequent thermal treatment from 450 to 1000 °C for 1 h with a heating/cooling rate of 1 °C min⁻¹, under atmospheric conditions. The effective sputter yield during the magnetron sputtering process was achieved with a DC power of 350 W, temperature of 250 °C and a deposition time of 6 h. The results showed that the anodization time played a key role in the growth of the Ta₂O₅ NTs and microstructural evolution. The nanotubes pore size and tube length varied from 18 to 30 nm and 73 nm to ∼4 μm as anodizing time rose from 30 s to 20 min, respectively. For the 450 °C annealed sample with the strongest adhesion, the scratch length, failure point and adhesion strength were 1024 μm, 863 μm and 2301 mN, respectively. The 450 °C annealed coating showed the highest wettability (lowest contact angle value) among the specimens. This multi-step approach could be considered for the design of various nanostructured titanium implant surfaces.

Supplementary files

Article information

DOI: https://doi.org/10.1039/C6RA11290K
Article type: Paper
Submitted: 01 May 2016
Accepted: 12 Aug 2016
First published: 12 Aug 2016

Download Citation

RSC Adv., 2016,6, 78999-79015

Author version available

Download author version (PDF)

Permissions

Request permissions

Optimizing PVD conditions for electrochemical anodization growth of well-adherent Ta₂O₅ nanotubes on Ti–6Al–4V alloy

M. Sarraf, B. Abdul Razak, A. Dabbagh, B. Nasiri-Tabrizi, N. H. Abu Kasim and W. J. Basirun, RSC Adv., 2016, 6, 78999 DOI: 10.1039/C6RA11290K

To request permission to reproduce material from this article, please go to the Copyright Clearance Center request page.

If you are an author contributing to an RSC publication, you do not need to request permission provided correct acknowledgement is given.

If you are the author of this article, you do not need to request permission to reproduce figures and diagrams provided correct acknowledgement is given. If you want to reproduce the whole article in a third-party publication (excluding your thesis/dissertation for which permission is not required) please go to the Copyright Clearance Center request page.

RSC Advances