Issue 16, 2016

Benzobisthiadiazole-alt-bithiazole copolymers with deep HOMO levels for good-performance field-effect transistors with air stability and a high on/off ratio

Abstract

Benzobisthiadiazole (BBT) is a widely used building block for its high electron affinity and planar configuration. BBT-based copolymers have resulted in good performance of organic field-effect transistors (OFETs). However, devices of these polymers are usually unstable in ambient air since most of these BBT-based polymers have high-lying HOMO energy levels (−4.3 to −4.8 eV). Besides, the field-effect transistors (FET) of BBT-based polymers show relatively low on/off ratios (102–104). As a result, it is very attractive to couple BBT with an electron-deficient block to construct new polymers with air stability. 2,2′-Bithiazole (BTz) is a potential building block due to its electron deficiency and trans-planar configuration. But incorporating 2,2′-bithiazole into polymers still remains a challenge since the organic tin compound of bithiazole is difficult to synthesize. In this article, we successfully prepared 5,5′-bis(trimethylstannyl)-2,2′-bithiazole by a three-step method and then synthesized two benzobisthiadiazole-alt-bithiazole copolymers (P1 and P2). Both P1 and P2 have a low-lying HOMO energy level (−5.3 eV), leading to air stability. Moreover the resulting FETs exhibit a very high on/off ratio (105–107) and a good hole mobility of up to 0.11 cm2 V−1 s−1, which represents a significant advancement for BBT-containing polymers.

Graphical abstract: Benzobisthiadiazole-alt-bithiazole copolymers with deep HOMO levels for good-performance field-effect transistors with air stability and a high on/off ratio

Supplementary files

Article information

Article type
Paper
Submitted
03 Feb 2016
Accepted
13 Mar 2016
First published
14 Mar 2016

Polym. Chem., 2016,7, 2808-2814

Benzobisthiadiazole-alt-bithiazole copolymers with deep HOMO levels for good-performance field-effect transistors with air stability and a high on/off ratio

C. Zhang, J. Zhang, W. Zeng, N. Zheng, W. Li, W. Gao, G. Yu and C. Yang, Polym. Chem., 2016, 7, 2808 DOI: 10.1039/C6PY00212A

To request permission to reproduce material from this article, please go to the Copyright Clearance Center request page.

If you are an author contributing to an RSC publication, you do not need to request permission provided correct acknowledgement is given.

If you are the author of this article, you do not need to request permission to reproduce figures and diagrams provided correct acknowledgement is given. If you want to reproduce the whole article in a third-party publication (excluding your thesis/dissertation for which permission is not required) please go to the Copyright Clearance Center request page.

Read more about how to correctly acknowledge RSC content.

Social activity

Spotlight

Advertisements