Solution-processed ultra-low-k thin films comprising single-walled aluminosilicate nanotubes

An-Chih Yang; Yun-Shiuan Li; Chon Hei Lam; Heng-Yu Chi; I-Chun Cheng; Dun-Yen Kang

doi:10.1039/C6NR06106K

You do not have JavaScript enabled. Please enable JavaScript to access the full features of the site or access our non-JavaScript page.

Solution-processed ultra-low-k thin films comprising single-walled aluminosilicate nanotubes†

An-Chih Yang,^a Yun-Shiuan Li,^b Chon Hei Lam,^a Heng-Yu Chi,^a I-Chun Cheng

*^b and Dun-Yen Kang*^a

Author affiliations

* Corresponding authors

^a Department of Chemical Engineering, National Taiwan University, No. 1, Sec. 4, Roosevelt Road, Taipei 10617, Taiwan
E-mail: dunyen@ntu.edu.tw

^b Graduate Institute of Photonics and Optoelectronics, National Taiwan University, No. 1, Sec. 4, Roosevelt Road, Taipei 10617, Taiwan
E-mail: iccheng@ntu.edu.tw

Abstract

Nanotube-based ultra-low-k thin films with high Young's modulus composed of single-walled aluminosilicate nanotubes (AlSiNTs) and a trace amount of poly(vinyl alcohol) (PVA) have been developed. The dehydrated AlSiNT film possesses a relative permittivity of 1.05, and a Young's modulus of 25 GPa, which exceed those of most existing ultra-low-k materials.

Download options Please wait...

Supplementary files

Supplementary information PDF (871K)

Article information

DOI: https://doi.org/10.1039/C6NR06106K
Article type: Communication
Submitted: 02 Aug 2016
Accepted: 13 Sep 2016
First published: 30 Sep 2016

Download Citation

Nanoscale, 2016,8, 17427-17432

Permissions

Request permissions

Solution-processed ultra-low-k thin films comprising single-walled aluminosilicate nanotubes

A. Yang, Y. Li, C. H. Lam, H. Chi, I. Cheng and D. Kang, Nanoscale, 2016, 8, 17427 DOI: 10.1039/C6NR06106K

To request permission to reproduce material from this article, please go to the Copyright Clearance Center request page.

If you are an author contributing to an RSC publication, you do not need to request permission provided correct acknowledgement is given.

If you are the author of this article, you do not need to request permission to reproduce figures and diagrams provided correct acknowledgement is given. If you want to reproduce the whole article in a third-party publication (excluding your thesis/dissertation for which permission is not required) please go to the Copyright Clearance Center request page.

Social activity

Fetching data from CrossRef.
This may take some time to load.

Nanoscale

Solution-processed ultra-low-k thin films comprising single-walled aluminosilicate nanotubes†

Abstract

Supplementary files

Article information

Download Citation

Permissions

Solution-processed ultra-low-k thin films comprising single-walled aluminosilicate nanotubes

Social activity

Search articles by author

Spotlight

Advertisements