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Issue 1, 2016
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Substrate tolerant direct block copolymer nanolithography

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Abstract

Block copolymer (BC) self-assembly constitutes a powerful platform for nanolithography. However, there is a need for a general approach to BC lithography that critically considers all the steps from substrate preparation to the final pattern transfer. We present a procedure that significantly simplifies the main stream BC lithography process, showing a broad substrate tolerance and allowing for efficient pattern transfer over wafer scale. PDMS-rich poly(styrene-b-dimethylsiloxane) (PS-b-PDMS) copolymers are directly applied on substrates including polymers, silicon and graphene. A single oxygen plasma treatment enables formation of the oxidized PDMS hard mask, PS block removal and polymer or graphene substrate patterning.

Graphical abstract: Substrate tolerant direct block copolymer nanolithography

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Publication details

The article was received on 01 Oct 2015, accepted on 12 Nov 2015 and first published on 13 Nov 2015


Article type: Communication
DOI: 10.1039/C5NR06815K
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Citation: Nanoscale, 2016,8, 136-140
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    Substrate tolerant direct block copolymer nanolithography

    T. Li, Z. Wang, L. Schulte and S. Ndoni, Nanoscale, 2016, 8, 136
    DOI: 10.1039/C5NR06815K

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