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Issue 9, 2016
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Laser fabrication of crystalline silicon nanoresonators from an amorphous film for low-loss all-dielectric nanophotonics

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Abstract

The concept of high refractive index subwavelength dielectric nanoresonators, supporting electric and magnetic optical resonance, is a promising platform for waveguiding, sensing, and nonlinear nanophotonic devices. However, high concentration of defects in the nanoresonators diminishes their resonant properties, which are crucially dependent on their internal losses. Therefore, it seems to be inevitable to use initially crystalline materials for fabrication of the nanoresonators. Here, we show that the fabrication of crystalline (low-loss) resonant silicon nanoparticles by femtosecond laser ablation of amorphous (high-loss) silicon thin films is possible. We apply two conceptually different approaches: recently proposed laser-induced transfer and a novel laser writing technique for large-scale fabrication of the crystalline nanoparticles. The crystallinity of the fabricated nanoparticles is proven by Raman spectroscopy and electron transmission microscopy, whereas optical resonant properties of the nanoparticles are studied using dark-field optical spectroscopy and full-wave electromagnetic simulations.

Graphical abstract: Laser fabrication of crystalline silicon nanoresonators from an amorphous film for low-loss all-dielectric nanophotonics

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Publication details

The article was received on 29 Sep 2015, accepted on 08 Dec 2015 and first published on 24 Dec 2015


Article type: Paper
DOI: 10.1039/C5NR06742A
Citation: Nanoscale, 2016,8, 5043-5048
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    Laser fabrication of crystalline silicon nanoresonators from an amorphous film for low-loss all-dielectric nanophotonics

    P. A. Dmitriev, S. V. Makarov, V. A. Milichko, I. S. Mukhin, A. S. Gudovskikh, A. A. Sitnikova, A. K. Samusev, A. E. Krasnok and P. A. Belov, Nanoscale, 2016, 8, 5043
    DOI: 10.1039/C5NR06742A

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