Issue 8, 2016

Spectral assignments in the infrared absorption region and anomalous thermal hysteresis in the interband electronic transition of vanadium dioxide films

Abstract

The metal–insulator transition (MIT) is of key importance for understanding the fundamental electronic interaction that determines the physical properties of vanadium dioxide (VO2) film. Here, the spectral slopes of transmittance and reflectance in the infrared absorption region (about 0.62–1.63 eV) and the interband electronic transitions for VO2 films with thicknesses of 27, 40 and 63 nm have been investigated. The potential applications of the spectral slopes were presented in detail. It is found that the variation of resistivity and transmittance increases with the spectral slopes of transmittance and reflectance. It is surprising that the resistivity of the VO2 film with a thickness of 27 nm is larger than that of the VO2 film with a thickness of 40 nm in the metal state. In addition, an anomalous counterclockwise thermal hysteresis with higher energy from the interband electronic transition was also found during the MIT process for the thinnest film. It is believed that this remarkable phenomenon could be related to the correlation effects in the rutile phase, which could lead to the splitting of the a1g band into Hubbard bands. The lower Hubbard band would result in an electronic transition blue-shift with the empty eσg band, which can explain the origin of the counterclockwise thermal hysteresis and the abnormal resistivity in the metal state.

Graphical abstract: Spectral assignments in the infrared absorption region and anomalous thermal hysteresis in the interband electronic transition of vanadium dioxide films

Article information

Article type
Paper
Submitted
02 Dec 2015
Accepted
28 Jan 2016
First published
28 Jan 2016

Phys. Chem. Chem. Phys., 2016,18, 6239-6246

Author version available

Spectral assignments in the infrared absorption region and anomalous thermal hysteresis in the interband electronic transition of vanadium dioxide films

P. Zhang, M. Li, Q. Deng, J. Zhang, J. Wu, Z. Hu and J. Chu, Phys. Chem. Chem. Phys., 2016, 18, 6239 DOI: 10.1039/C5CP07416A

To request permission to reproduce material from this article, please go to the Copyright Clearance Center request page.

If you are an author contributing to an RSC publication, you do not need to request permission provided correct acknowledgement is given.

If you are the author of this article, you do not need to request permission to reproduce figures and diagrams provided correct acknowledgement is given. If you want to reproduce the whole article in a third-party publication (excluding your thesis/dissertation for which permission is not required) please go to the Copyright Clearance Center request page.

Read more about how to correctly acknowledge RSC content.

Social activity

Spotlight

Advertisements