Issue 31, 2016

Ultrathin epitaxial InAs layer relaxation on cross-hatch stress fields

Abstract

Thin, highly-strained InAs layers epitaxially grown on GaAs/InGaAs cross-hatch surfaces undergo postgrowth transformations that yield several morphologies ranging from aligned quantum wires to quantum dots and micron-scale pyramids. The shape varieties result from the multiple pathways created from the combined/competitive effects of asymmetric adatom diffusions, subsurface stress fields and misfit energy minimization. These morphologies reveal the multiple outcomes of metastable states between the two- and the three-dimensional transition that if properly captured and engineered may open up new windows of opportunities both in devices such as sensors and in fundamental quantum studies.

Graphical abstract: Ultrathin epitaxial InAs layer relaxation on cross-hatch stress fields

Article information

Article type
Paper
Submitted
13 May 2016
Accepted
21 Jun 2016
First published
07 Jul 2016

CrystEngComm, 2016,18, 5852-5859

Ultrathin epitaxial InAs layer relaxation on cross-hatch stress fields

W. Eiwwongcharoen, N. Nakareseisoon, S. Thainoi, S. Panyakeow and S. Kanjanachuchai, CrystEngComm, 2016, 18, 5852 DOI: 10.1039/C6CE01127F

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