Issue 35, 2016
From the journal:

CrystEngComm

A reproducible low temperature chemical solution deposition of non-polar [11[2 with combining macron]0] and [10[1 with combining macron]0] ZnO films for optoelectronic applications

Lin Qi,a   M. Babar Shahzad*c  and  Yang Qi*ab  

* Corresponding authors

a Institute of Materials Physics and Chemistry, School of Materials Science and Engineering, Northeastern University, Shenyang 110819, PR China
E-mail: qiyang@imp.neu.edu.cn

b Key Laboratory for Anisotropy and Texture of Materials, School of Materials Science and Engineering, Northeastern University, Shenyang 110819, PR China

c Institute of Metal Research, Chinese Academy of Sciences, Shenyang 110016, PR China
E-mail: babar@imr.ac.cn

Abstract

ZnO films with non-polar a-plane (11[2 with combining macron]0) and m-plane (10[1 with combining macron]0) orientations are fabricated on Si (100) substrates by low temperature chemical solution deposition. This distinctive growth is achieved by a co-effect of the seed layer templates and CBD solution. The growth mechanism is illustrated in detail and these non-polar ZnO/Si heterostructures show an excellent unidirectional conductivity which is comparable with other one-dimensional ZnO heterostructures.

Graphical abstract: A reproducible low temperature chemical solution deposition of non-polar [11 [[2 with combining macron]] 0] and [10 [[1 with combining macron]] 0] ZnO films for optoelectronic applications

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Article information

DOI
https://doi.org/10.1039/C6CE01054G
Article type
Communication
Submitted
05 May 2016
Accepted
28 Jul 2016
First published
28 Jul 2016

CrystEngComm, 2016,18, 6573-6578

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A reproducible low temperature chemical solution deposition of non-polar [11[2 with combining macron]0] and [10[1 with combining macron]0] ZnO films for optoelectronic applications

L. Qi, M. B. Shahzad and Y. Qi, CrystEngComm, 2016, 18, 6573 DOI: 10.1039/C6CE01054G

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