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Issue 10, 2015
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A two-step annealing process for enhancing the ferroelectric properties of poly(vinylidene fluoride) (PVDF) devices

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Abstract

We report a simple two-step annealing scheme for the fabrication of stable non-volatile memory devices employing poly(vinylidene fluoride) (PVDF) polymer thin-films. The proposed two-step annealing scheme comprises the crystallization of the ferroelectric gamma-phase during the first step and enhancement of the PVDF film dense morphology during the second step. Moreover, when we extended the processing time of the second step, we obtained good hysteresis curves down to 1 Hz, the first such report for ferroelectric PVDF films. The PVDF films also exhibit a coercive field of 113 MV m−1 and a ferroelectric polarization of 5.4 μC cm−2.

Graphical abstract: A two-step annealing process for enhancing the ferroelectric properties of poly(vinylidene fluoride) (PVDF) devices

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Publication details

The article was received on 16 Sep 2014, accepted on 14 Jan 2015 and first published on 16 Jan 2015


Article type: Paper
DOI: 10.1039/C4TC02079K
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J. Mater. Chem. C, 2015,3, 2366-2370

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    A two-step annealing process for enhancing the ferroelectric properties of poly(vinylidene fluoride) (PVDF) devices

    J. H. Park, N. Kurra, M. N. AlMadhoun, I. N. Odeh and H. N. Alshareef, J. Mater. Chem. C, 2015, 3, 2366
    DOI: 10.1039/C4TC02079K

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