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Issue 120, 2015
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Oxidation behaviour of copper nanofractals produced by soft-landing of size-selected nanoclusters

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Abstract

We report the oxidation dynamics of a copper nanocluster assembled film, containing fractal islands, fabricated by the soft-landing of size-selected copper nanoclusters with an average diameter of 3 nm. The time evolution of the spontaneous oxidation of the prepared film in air at room temperature (RT) was studied. A compositional analysis of the film was carried out in an ultra-high vacuum (UHV) deposition chamber using an in situ X-ray photoelectron spectroscopy (XPS) system. The morphological aspects of the deposited film were studied with a high resolution scanning electron microscope (SEM) and an atomic force microscope (AFM). We report the spontaneous production of highly pure (∼95%) and technologically appealing nano-crystalline Cu2O within 300 seconds of air exposure. The crystalline structure was probed using high resolution transmission electron microscopy (HRTEM) and the optical properties were studied using a cathodoluminescence (CL) device attached to a SEM.

Graphical abstract: Oxidation behaviour of copper nanofractals produced by soft-landing of size-selected nanoclusters

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Publication details

The article was received on 07 Oct 2015, accepted on 02 Nov 2015 and first published on 03 Nov 2015


Article type: Paper
DOI: 10.1039/C5RA20694D
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Citation: RSC Adv., 2015,5, 99425-99430

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    Oxidation behaviour of copper nanofractals produced by soft-landing of size-selected nanoclusters

    S. Mondal and S. R. Bhattacharyya, RSC Adv., 2015, 5, 99425
    DOI: 10.1039/C5RA20694D

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