Issue 84, 2015

Horizontal growth of MoS2 nanowires by chemical vapour deposition

Abstract

We describe a single step route for the synthesis of MoS2 wires using a chemical vapour deposition (CVD) method. By tuning the CVD growth parameters, the horizontally oriented MoS2 nanowires on SiO2/Si substrate can be synthesized successfully. The MoS2 nanowire has height of about 93 nm and width of about 402 nm with multilayer structure. Good local photoluminescence (PL) properties can be observed for these horizontal MoS2 nanowires. The successful fabrication and prominent PL effect of the horizontal MoS2 nanowires provide potential applications for the MoS2-based in planar devices.

Graphical abstract: Horizontal growth of MoS2 nanowires by chemical vapour deposition

Article information

Article type
Paper
Submitted
13 Jul 2015
Accepted
06 Aug 2015
First published
06 Aug 2015

RSC Adv., 2015,5, 68283-68286

Horizontal growth of MoS2 nanowires by chemical vapour deposition

S. Han, C. Yuan, X. Luo, Y. Cao, T. Yu, Y. Yang, Q. Li and S. Ye, RSC Adv., 2015, 5, 68283 DOI: 10.1039/C5RA13733K

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