A simple growth method for Nb2O5 films and their optical properties

Abstract

A simple method for the synthesis of Nb₂O₅ films of thicknesses ranging from tens to several hundreds of nanometers on amorphous silicon dioxide or quartz substrates is presented. Nb₂O₅ films were formed by annealing the sputter deposited Nb films under an Ar flow and without oxygen plasma in a quartz tube within a furnace at 850 °C. The structural, compositional, optical, and vibrational properties were characterized by grazing incidence X-ray diffraction, transmission electron microscopy, X-ray photoelectron spectroscopy, ultraviolet visible spectroscopy, and Raman scattering. Each of the Nb₂O₅ films is polycrystalline with an orthorhombic crystal structure. We observed vibrational modes including longitudinal optical, transverse optical, and triply degenerate modes, and measured the indirect optical band gap to be ∼3.65 eV. The transmittance spectrum of the ∼20 nm thick Nb₂O₅ film shows over 90% transmittance below the band gap energy in the visible wavelength range and decreases to less than 20% in the ultraviolet regime. The optical properties of the films in the UV-vis range show potential applications as UV detectors.