Issue 28, 2015
From the journal:

Nanoscale

Correction: Enhanced photoelectrochemical water oxidation via atomic layer deposition of TiO2 on fluorine-doped tin oxide nanoparticle films

Isvar A. Cordova,*a   Qing Peng,*a   Isa L. Ferrall,a   Adam J. Rieth,b   Paul G. Hoertzb  and  Jeffrey T. Glass*a  

* Corresponding authors

a Electrical and Computer Engineering Department, Duke University, Durham, NC, USA
E-mail: isvar.cordova@duke.edu

b RTI International, Durham, NC, USA

Abstract

Correction for ‘Enhanced photoelectrochemical water oxidation via atomic layer deposition of TiO2 on fluorine-doped tin oxide nanoparticle films’ by Isvar A. Cordova, et al., Nanoscale, 2015, 7, 8584–8592.

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Article information

DOI
https://doi.org/10.1039/C5NR90125A
Article type
Correction
Submitted
17 Jun 2015
Accepted
17 Jun 2015
First published
02 Jul 2015
This article is Open Access
Creative Commons BY license

Nanoscale, 2015,7, 12226-12226

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Correction: Enhanced photoelectrochemical water oxidation via atomic layer deposition of TiO2 on fluorine-doped tin oxide nanoparticle films

I. A. Cordova, Q. Peng, I. L. Ferrall, A. J. Rieth, P. G. Hoertz and J. T. Glass, Nanoscale, 2015, 7, 12226 DOI: 10.1039/C5NR90125A

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