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Issue 15, 2015
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Positively-charged reduced graphene oxide as an adhesion promoter for preparing a highly-stable silver nanowire film

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Abstract

An ultrathin conductive adhesion promoter using positively charged reduced graphene oxide (rGO-NH3+) has been demonstrated for preparing highly stable silver nanowire transparent conductive electrodes (AgNW TCEs). The adhesion promoter rGO-NH3+, spray coated between the substrate and AgNWs, significantly enhances the chemical and mechanical stabilities of the AgNW TCEs. Besides, the ultrathin thickness of the rGO-NH3+ ensures excellent optical transparency and mechanical flexibility for TCEs. The AgNW films prepared using the adhesion promoter are extremely stable under harsh conditions, including ultrasonication in a variety of solvents, 3M Scotch tape detachment test, mechanical bending up to 0.3% strain, or fatigue over 1000 cycles. The greatly enhanced adhesion force is attributed to the ionic interactions between the positively charged protonated amine groups in rGO-NH3+ and the negatively charged hydroxo- and oxo-groups on the AgNWs. The positively charged GO-NH3+ and commercial polycationic polymer (poly allylamine hydrochloride) are also prepared as adhesion promoters for comparison with rGO-NH3+. Notably, the closely packed hexagonal atomic structure of rGO offers better barrier properties to water permeation and demonstrates promising utility in durable waterproof electronics. This work offers a simple method to prepare high-quality TCEs and is believed to have great potential application in flexible waterproof electronics.

Graphical abstract: Positively-charged reduced graphene oxide as an adhesion promoter for preparing a highly-stable silver nanowire film

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Supplementary files

Article information


Submitted
03 Feb 2015
Accepted
13 Mar 2015
First published
16 Mar 2015

Nanoscale, 2015,7, 6798-6804
Article type
Paper
Author version available

Positively-charged reduced graphene oxide as an adhesion promoter for preparing a highly-stable silver nanowire film

Q. Sun, S. J. Lee, H. Kang, Y. Gim, H. S. Park and J. H. Cho, Nanoscale, 2015, 7, 6798
DOI: 10.1039/C5NR00777A

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