Ordered mesoporous silica films with pores oriented perpendicular to a titanium nitride substrate

Abstract

The production of thin mesoporous silica films with small (∼2–3 nm) pores oriented perpendicular to a titanium nitride growth surface is demonstrated using two methods. These are the growth from a Stöber silica solution with surfactant ordering at the surface of the electrode, and electrochemically assisted growth from an acidic sol achieved by polarisation of the electrode surface. The thickness, pore order and pore size that can be achieved with these two methods is contrasted. A number of methods to vary the pore size by using different surfactants and swelling agents are explored. The advantage of applying these growth methods on titanium nitride surfaces is that it provides access to a wider electrochemical window for nanowire growth and sensor applications with non-aqueous electrolytes whilst retaining good film growth and adhesion properties.