Ion-precursor and ion-dose dependent anti-galvanic reduction†
Abstract
Controlling alloy nanoparticles with atomic monodispersity is challenging, and the recently revealed anti-galvanic reduction (AGR) provides a unique solution to this challenge. Herein we demonstrate that AGR is ion-precursor and ion-dose dependent, which offers novel strategies to tune the composition, structure and properties of nanoparticles by varying the ion-precursor and ion-dose in the AGR reaction.