Issue 11, 2015

Microwave assisted formation of monoreactive perfluoroalkylsilane-based self-assembled monolayers

Abstract

We demonstrate the use of microwave radiation as a tool to accelerate the formation of perfluoroalkylsilane based self-assembled monolayers (SAMs) on silicon oxide surfaces. Surface coverage of these SAMs of monoreactive perfluoroalkylsilanes increased in proportion to the duration over which the solutions were heated by microwave radiation.

Graphical abstract: Microwave assisted formation of monoreactive perfluoroalkylsilane-based self-assembled monolayers

Supplementary files

Article information

Article type
Communication
Submitted
23 Sep 2014
Accepted
15 Dec 2014
First published
15 Dec 2014

Chem. Commun., 2015,51, 2060-2063

Author version available

Microwave assisted formation of monoreactive perfluoroalkylsilane-based self-assembled monolayers

A. W. H. Lee, B. K. Pilapil, H. W. Ng and B. D. Gates, Chem. Commun., 2015, 51, 2060 DOI: 10.1039/C4CC07494G

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