Issue 8, 2014

Cross-linkable linear copolymer with double functionality: resist for electron beam nanolithography and molecular imprinting

Abstract

The first demonstration of a molecularly imprinted polymer patterned by electron beam lithography (EBL) direct writing is reported. The polymeric mixture is based on a linear co-polymer that behaves simultaneously as a positive-tone EBL resist and, after polymerization in the presence of rhodamine 123 (R123) as a model analyte, as a selective and sensitive synthetic receptor for the template. Analyte binding was evaluated by fluorescence confocal microscopy and the imprinting effect was confirmed in the presence of compounds structurally related to R123.

Graphical abstract: Cross-linkable linear copolymer with double functionality: resist for electron beam nanolithography and molecular imprinting

Supplementary files

Article information

Article type
Communication
Submitted
01 Aug 2013
Accepted
29 Dec 2013
First published
07 Jan 2014

J. Mater. Chem. C, 2014,2, 1400-1403

Cross-linkable linear copolymer with double functionality: resist for electron beam nanolithography and molecular imprinting

S. Carrasco, V. Canalejas-Tejero, F. Navarro-Villoslada, C. A. Barrios and M. C. Moreno-Bondi, J. Mater. Chem. C, 2014, 2, 1400 DOI: 10.1039/C3TC31499E

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