Issue 23, 2014

A cobalt layer deposition study: Dicobaltatetrahedranes as convenient MOCVD precursor systems

Abstract

Low melting or liquid cobalt(0) MOCVD precursors of type [Co2(CO)62-RC[triple bond, length as m-dash]CR′)] (R = H, R′ = (CH3)3Si, nC4H9, nC5H11, nC6H13, nC7H15; R = nC3H7, R′ = (CH3)3Si, CH3; R = R′ = C2H5, (CH3)3Si) have been prepared by the reaction of the appropriate alkynes with Co2(CO)8. Variation of the substituents at the C,C triple bond allowed the study of their influence on the thermal behaviour and vapour pressure. These measurements showed that the cobalt(0) precursors are suitable for application within the MOCVD (Metal–Organic Chemical Vapour Deposition) process. Decomposing deposition of the cobalt precursors was realized in a home-built vertical cold-wall CVD reactor under mild conditions without any addition of co-reactants. The obtained dense and conformal cobalt layers have been characterized by SEM, EDX and XPS measurements. Depending on the precursor applied, pure cobalt films (96.7% Co) or mixtures of cobalt, carbon and cobalt oxide with varying composition with layer thicknesses of 35–90 nm were formed.

Graphical abstract: A cobalt layer deposition study: Dicobaltatetrahedranes as convenient MOCVD precursor systems

Article information

Article type
Paper
Submitted
12 Feb 2014
Accepted
14 Mar 2014
First published
14 Mar 2014
This article is Open Access
Creative Commons BY license

J. Mater. Chem. C, 2014,2, 4676-4682

A cobalt layer deposition study: Dicobaltatetrahedranes as convenient MOCVD precursor systems

C. Georgi, A. Hildebrandt, T. Waechtler, S. E. Schulz, T. Gessner and H. Lang, J. Mater. Chem. C, 2014, 2, 4676 DOI: 10.1039/C4TC00288A

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