The reduction of resistance and surface roughness obtained by CO2 cluster jet were up to 81% and 42.3% compared with pristine graphene. The shifts in Raman spectra also implied chemical doping and “mono-layerization”. Thus, CO2 cluster jet has the potential for planarization, cleaning and flattening of the graphene.
H. Choi, J. A. Kim, Y. Cho, T. Hwang, J. Lee and T. Kim, RSC Adv., 2014, 4, 41922 DOI: 10.1039/C4RA05079G
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