Fabrication of Cu1.8S/CuS nanoplates counter electrode via alternating current etching for quantum dots-sensitized solar cells

Linlin Quan; Weiping Li; Liqun Zhu; Xiaowen Chang; Huicong Liu

doi:10.1039/C4RA04082A

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Fabrication of Cu_1.8S/CuS nanoplates counter electrode via alternating current etching for quantum dots-sensitized solar cells

Linlin Quan,^a Weiping Li,*^a Liqun Zhu,^a Xiaowen Chang^a and Huicong Liu*^a

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* Corresponding authors

^a Key Laboratory of Aerospace Materials and Performance (Ministry of Education), School of Materials Science and Engineering, Beihang University, Beijing 100191, China
E-mail: liweiping@buaa.edu.cn, liuhc@buaa.edu.cn
Fax: +86 1082317113
Tel: +86 1082317113

Abstract

We demonstrate a method for fabricating a Cu_1.8S/CuS nanoplate counter electrode (CE) via the alternating current (AC) etching of brass. The photoelectrochemical performance and electrocatalytic properties of Cu_1.8S/CuS CE with a η value of 3.22% are much higher than those of Pt and conventional Cu₂S CEs. Furthermore, it offers a simple and low cost method for producing CuS counter electrodes in the future.

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Article information

DOI: https://doi.org/10.1039/C4RA04082A
Article type: Paper
Submitted: 04 May 2014
Accepted: 23 Jun 2014
First published: 23 Jun 2014

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RSC Adv., 2014,4, 32214-32220

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Fabrication of Cu_1.8S/CuS nanoplates counter electrode via alternating current etching for quantum dots-sensitized solar cells

L. Quan, W. Li, L. Zhu, X. Chang and H. Liu, RSC Adv., 2014, 4, 32214 DOI: 10.1039/C4RA04082A

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Fabrication of Cu_1.8S/CuS nanoplates counter electrode via alternating current etching for quantum dots-sensitized solar cells

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Fabrication of Cu_1.8S/CuS nanoplates counter electrode via alternating current etching for quantum dots-sensitized solar cells

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