Issue 72, 2014

Fabrication of concentric microarrays for self-assembly and manipulation of particle distribution

Abstract

We demonstrate the use of a micropatterned surface composed of a concentric circular array of SiO2 and Si layers to distribute particles from edge to centre and reduce the coffee stain effect from a colloidal or suspended solution droplet after natural evaporation by self assembly over the array. The alternating SiO2/Si layers of the concentric circular array have widths of 3 μm and depths of 400 nm, and its surface is nonhomogeneous due to the presence of the alternating hydrophilic (SiO2)–hydrophobic (Si) layers and the 400 nm variation in surface roughness. The droplet diameter, contact angle and droplet height change more rapidly from the top of such a surface compared to plain Si/SiO2 during natural evaporation. The depinning process, capillary force and Marangoni convection are the likely drying mechanisms of particle advection in the droplet. This results in even distribution on the top and side walls of the SiO2 ring and thus minimizes problems associated with the “coffee-stain” effect, providing better distribution when dispensed from a solution. The particle distribution is restricted to the top of the circular rims and the sides or the floor of the space between the rings depending on the surface energy of the ring surfaces, the structural geometry and the natural evaporation of the droplet.

Graphical abstract: Fabrication of concentric microarrays for self-assembly and manipulation of particle distribution

Article information

Article type
Paper
Submitted
25 Apr 2014
Accepted
28 Jul 2014
First published
30 Jul 2014

RSC Adv., 2014,4, 38384-38388

Author version available

Fabrication of concentric microarrays for self-assembly and manipulation of particle distribution

L. K. Bera, O. K. Soo and W. Z. Zheng, RSC Adv., 2014, 4, 38384 DOI: 10.1039/C4RA03767G

To request permission to reproduce material from this article, please go to the Copyright Clearance Center request page.

If you are an author contributing to an RSC publication, you do not need to request permission provided correct acknowledgement is given.

If you are the author of this article, you do not need to request permission to reproduce figures and diagrams provided correct acknowledgement is given. If you want to reproduce the whole article in a third-party publication (excluding your thesis/dissertation for which permission is not required) please go to the Copyright Clearance Center request page.

Read more about how to correctly acknowledge RSC content.

Social activity

Spotlight

Advertisements