Towards Si@SiO2 core–shell, yolk–shell, and SiO2 hollow structures from Si nanoparticles through a self-templated etching–deposition process

Jin Niu; Su Zhang; Yue Niu; Ranran Song; Huaihe Song; Xiaohong Chen; Jisheng Zhou; Song Hong

doi:10.1039/C4RA02236J

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Towards Si@SiO₂ core–shell, yolk–shell, and SiO₂ hollow structures from Si nanoparticles through a self-templated etching–deposition process†

Jin Niu,‡^a Su Zhang,‡^a Yue Niu,^a Ranran Song,^a Huaihe Song,*^a Xiaohong Chen,^a Jisheng Zhou^a and Song Hong^a

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* Corresponding authors

^a State Key Laboratory of Chemical Resource Engineering, Beijing Key Laboratory of Electrochemical Process and Technology for Materials, Beijing University of Chemical Technology, Beijing, P. R. China
E-mail: songhh@mail.buct.edu.cn
Fax: +86-10-6443-4916
Tel: +86-10-6443-4916

Abstract

Si@SiO₂ core–shell, yolk–shell, and SiO₂ hollow structures can be obtained when Si nanoparticles are simply treated with ammonia–water–ethanol solution at room temperature. Their formation mechanism is attributed to the self-templated etching–deposition process.

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Article information

DOI: https://doi.org/10.1039/C4RA02236J
Article type: Communication
Submitted: 14 Mar 2014
Accepted: 09 Jun 2014
First published: 09 Jun 2014

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RSC Adv., 2014,4, 29435-29438

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Towards Si@SiO₂ core–shell, yolk–shell, and SiO₂ hollow structures from Si nanoparticles through a self-templated etching–deposition process

J. Niu, S. Zhang, Y. Niu, R. Song, H. Song, X. Chen, J. Zhou and S. Hong, RSC Adv., 2014, 4, 29435 DOI: 10.1039/C4RA02236J

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