A self-aligned aperture-microlens array

Abstract

In a range of optical systems, an aperture-microlens array (A-MLA) is used extensively for selective transmission and diffraction integration. As the large-size, high resolution and flexibility required recently for a variety of advanced optical devices can barely be satisfied using a conventional A-MLA fabrication process, a new A-MLA fabrication process is needed for the high utilization, performance and throughput. In this work, a new A-MLA fabrication process was successfully developed by selectively photo-crosslinking only the photoresist portion precisely aligned with the microlens array. The process developed offers substantial advantages over conventional alignment process using a mask aligner in terms of precise alignment not only in the x, y plane but also along the z-direction, allowing fast/mass fabrication of large sized A-MLA. The A-MLA fabricated is expected to contribute to the development of various advanced optical systems including “live” confocal microscopy to acquire three-dimensional images rapidly.