Jump to main content
Jump to site search

Issue 24, 2014
Previous Article Next Article

Tunable and rapid self-assembly of block copolymers using mixed solvent vapors

Author affiliations

Abstract

Pattern generation of well-controlled block copolymers (BCPs) with a high Flory–Huggins interaction parameter (χ) is important for applications in sub-20 nm nanolithography. We used mixed solvents of dimethylformamide (DMF) and toluene to control the morphology as well as the time to achieve the targeted morphology via self-assembly of BCPs. By precisely controlling the volume ratio of DMF and toluene, well-ordered line, honeycomb, circular hole, and lamellar nanostructures were obtained from a cylinder-forming poly(styrene-b-2-vinylpyridine) (PS-b-P2VP) BCP with high χ. Furthermore, a well-aligned 12 nm line pattern was successfully achieved in the guiding template within one minute using the mixed solvents. This practical method may also be applicable to self-assembly of other BCPs, providing more opportunities for the next-generation sub-10 nm lithography applications.

Graphical abstract: Tunable and rapid self-assembly of block copolymers using mixed solvent vapors

Back to tab navigation

Supplementary files

Publication details

The article was received on 17 Aug 2014, accepted on 08 Oct 2014 and first published on 06 Nov 2014


Article type: Paper
DOI: 10.1039/C4NR04726E
Author version
available:
Download author version (PDF)
Nanoscale, 2014,6, 15216-15221

  •   Request permissions

    Tunable and rapid self-assembly of block copolymers using mixed solvent vapors

    W. I. Park, S. Tong, Y. Liu, I. W. Jung, A. Roelofs and S. Hong, Nanoscale, 2014, 6, 15216
    DOI: 10.1039/C4NR04726E

Search articles by author

Spotlight

Advertisements