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Issue 22, 2014
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Alteration of architecture of MoO3 nanostructures on arbitrary substrates: growth kinetics, spectroscopic and gas sensing properties

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Abstract

MoO3 nanostructures have been grown in thin film form on five different substrates by RF magnetron sputtering and subsequent annealing; non-aligned nanorods, aligned nanorods, bundled nanowires, vertical nanorods and nanoslabs are formed respectively on the glass, quartz, wafer, alumina and sapphire substrates. The nanostructures formed on these substrates are characterized by AFM, SEM, GIXRD, XPS, micro-Raman, diffuse reflectance and photoluminescence spectroscopy. A detailed growth model for morphology alteration with respect to substrates has been discussed by considering various aspects such as surface roughness, lattice parameters and the thermal expansion coefficient, of both substrates and MoO3. The present study developed a strategy for the choice of substrates to materialize different types MoO3 nanostructures for future thin film applications. The gas sensing tests point towards using these MoO3 nanostructures as principal detection elements in gas sensors.

Graphical abstract: Alteration of architecture of MoO3 nanostructures on arbitrary substrates: growth kinetics, spectroscopic and gas sensing properties

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Article information


Submitted
07 Aug 2014
Accepted
13 Sep 2014
First published
16 Sep 2014

Nanoscale, 2014,6, 13882-13894
Article type
Paper
Author version available

Alteration of architecture of MoO3 nanostructures on arbitrary substrates: growth kinetics, spectroscopic and gas sensing properties

N. Illyaskutty, S. Sreedhar, G. Sanal Kumar, H. Kohler, M. Schwotzer, C. Natzeck and V. P. M. Pillai, Nanoscale, 2014, 6, 13882
DOI: 10.1039/C4NR04529G

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