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Issue 21, 2014
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Classic, liquid, and matrix-assisted dip-pen nanolithography for materials research

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Abstract

As a powerful atomic force microscopy-based nanotechnological tool, dip-pen nanolithography (DPN) has provided an ideal direct-write “constructive” lithographic tool that allows materials to be patterned from DPN tips onto a surface with high registration and sub-15 nm resolution. In the past few decades, DPN has been enormously developed for studying the patterning of inorganic, organic, and biological materials onto a variety of substrates. The focus of this review is on the development of three types of DPN: classic, liquid, and matrix-assisted DPN. Such development mainly includes the following aspects: the comparisons of three types of DPN, the effect factors and basic mechanisms of three types of DPN, and the application progress of three types of DPN.

Graphical abstract: Classic, liquid, and matrix-assisted dip-pen nanolithography for materials research

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Publication details

The article was received on 29 Jul 2014, accepted on 01 Sep 2014 and first published on 03 Sep 2014


Article type: Review Article
DOI: 10.1039/C4NR04296D
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Citation: Nanoscale, 2014,6, 12217-12228

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    Classic, liquid, and matrix-assisted dip-pen nanolithography for materials research

    J. Zhong, G. Sun and D. He, Nanoscale, 2014, 6, 12217
    DOI: 10.1039/C4NR04296D

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