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Issue 12, 2014
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Solvent immersion imprint lithography

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Abstract

We present Solvent Immersion Imprint Lithography (SIIL), a technique for polymer functionalization and microsystem prototyping. SIIL is based on polymer immersion in commonly available solvents. This was experimentally and computationally analyzed, uniquely enabling two practical aspects. The first is imprinting and bonding deep features that span the 1 to 100 μm range, which are unattainable with existing solvent-based methods. The second is a functionalization scheme characterized by a well-controlled, 3D distribution of chemical moieties. SIIL is validated by developing microfluidics with embedded 3D oxygen sensors and microbioreactors for quantitative metabolic studies of a thermophile anaerobe microbial culture. Polystyrene (PS) was employed in the aforementioned applications; however all soluble polymers – including inorganic ones – can be employed with SIIL under no instrumentation requirements and typical processing times of less than two minutes.

Graphical abstract: Solvent immersion imprint lithography

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Publication details

The article was received on 20 Feb 2014, accepted on 08 Apr 2014 and first published on 08 Apr 2014


Article type: Paper
DOI: 10.1039/C4LC00226A
Citation: Lab Chip, 2014,14, 2072-2080
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    Solvent immersion imprint lithography

    A. E. Vasdekis, M. J. Wilkins, J. W. Grate, R. T. Kelly, A. E. Konopka, S. S. Xantheas and T.-M. Chang, Lab Chip, 2014, 14, 2072
    DOI: 10.1039/C4LC00226A

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