Issue 23, 2014

Growth mechanism of vertically aligned SnSe nanosheets via physical vapour deposition

Abstract

Vertically aligned SnSe nanosheets were successfully synthesized on different substrates (silicon, quartz, and fluorine-doped tin oxide glass) via a non-catalytic vapour phase synthesis method for the first time. Such substrate independent feature could benefit the fabrication and application of various nanodevices due to the considerably enhanced surface area. The SnSe nanosheets have the thickness of ~20–30 nm and the lateral dimension of several micrometers. The analyses using X-ray diffraction and high-resolution transmission electron microscopy demonstrate that the nanosheets are single crystalline with an orthorhombic crystal structure of the Pnma 62 space group. Two-dimensional nanosheets were formed due to the anisotropic atomic bonding nature of the SnSe crystal, which is apparently different from the oriented attachment growth or the exposed plane suppressing growth. They also revealed faceted edge planes, which was elucidated in detail based upon the difference in the surface energy of each atomic plane. SnSe nanosheets show a direct band gap of ~1.1 eV, ideally meeting the requirements as high-performance light absorbing materials for solar cell applications.

Graphical abstract: Growth mechanism of vertically aligned SnSe nanosheets via physical vapour deposition

Supplementary files

Article information

Article type
Paper
Submitted
27 Jan 2014
Accepted
07 Mar 2014
First published
10 Mar 2014

CrystEngComm, 2014,16, 5080-5086

Author version available

Growth mechanism of vertically aligned SnSe nanosheets via physical vapour deposition

X. Ma, K. Cho and Y. Sung, CrystEngComm, 2014, 16, 5080 DOI: 10.1039/C4CE00213J

To request permission to reproduce material from this article, please go to the Copyright Clearance Center request page.

If you are an author contributing to an RSC publication, you do not need to request permission provided correct acknowledgement is given.

If you are the author of this article, you do not need to request permission to reproduce figures and diagrams provided correct acknowledgement is given. If you want to reproduce the whole article in a third-party publication (excluding your thesis/dissertation for which permission is not required) please go to the Copyright Clearance Center request page.

Read more about how to correctly acknowledge RSC content.

Social activity

Spotlight

Advertisements