Hydrogen-free PECVD growth of few-layer graphene on an ultra-thin nickel film at the threshold dissolution temperature
Abstract
The synthesis of few-layer
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* Corresponding authors
a
Graduate Institute of Photonics and Optoelectronics, Department of Electrical Engineering, National Taiwan University, No. 1, Sec. 4, Roosevelt Road, Taipei 106, Taiwan R.O.C.
E-mail:
grlin@ntu.edu.tw
Fax: +886-2-33669598
Tel: +886-2-33663700 ext. 235
b Department of Physics, National Taiwan University, No. 1, Sec. 4, Roosevelt Road, Taipei 106, Taiwan R.O.C.
c Department of Opto-Electronic Engineering, National Dong Hwa University, No. 1, Sec. 2, Da Hsueh Rd., Shoufeng, Hualien 97401, Taiwan R.O.C.
The synthesis of few-layer
K. Peng, C. Wu, Y. Lin, Y. Liu, D. Tsai, Y. Pai and G. Lin, J. Mater. Chem. C, 2013, 1, 3862 DOI: 10.1039/C3TC30332B
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