Issue 36, 2013

Proton conducting zeolite films for low-voltage oxide-based electric-double-layer thin-film transistors and logic gates

Abstract

Three-dimensional nanoporous zeolite films with Linde Type A (LTA) structure prepared by a seeding-free synthesis strategy exhibited high room-temperature proton conductivity and large electric-double-layer (EDL) capacitance. In-plane-gate indium-zinc-oxide thin-film transistors gated by such proton conducting zeolite LTA films were fabricated by a simple self-assembled method. Due to the strong EDL capacitive coupling triggered by mobile protons in zeolite LTA, such transistors showed a low-voltage operation of 1.5 V and a high performance with a large field-effect mobility of 13 cm2 V−1 s−1 and a small subthreshold swing of 95 mV per decade. Furthermore, AND logic operation was also experimentally demonstrated on the dual in-plane-gate EDL transistors. Our results strongly indicate that zeolite LTA films are promising gate dielectric candidates for application in low-voltage and low-cost electronics, which greatly expands the application areas of zeolites.

Graphical abstract: Proton conducting zeolite films for low-voltage oxide-based electric-double-layer thin-film transistors and logic gates

Article information

Article type
Paper
Submitted
27 Jun 2013
Accepted
16 Jul 2013
First published
17 Jul 2013

J. Mater. Chem. C, 2013,1, 5669-5674

Proton conducting zeolite films for low-voltage oxide-based electric-double-layer thin-film transistors and logic gates

G. Wu, H. Zhang, J. Zhou, A. Huang and Q. Wan, J. Mater. Chem. C, 2013, 1, 5669 DOI: 10.1039/C3TC31236D

To request permission to reproduce material from this article, please go to the Copyright Clearance Center request page.

If you are an author contributing to an RSC publication, you do not need to request permission provided correct acknowledgement is given.

If you are the author of this article, you do not need to request permission to reproduce figures and diagrams provided correct acknowledgement is given. If you want to reproduce the whole article in a third-party publication (excluding your thesis/dissertation for which permission is not required) please go to the Copyright Clearance Center request page.

Read more about how to correctly acknowledge RSC content.

Social activity

Spotlight

Advertisements