Electrically and thermally stable gate dielectrics from thiol–ene cross-linked systems for use in organic thin-film transistors†
Abstract
Novel solution-processable
* Corresponding authors
a
Division of Advanced Materials, Korea Research Institute of Chemical Technology, 141 Gajeong-ro, Yuseong-gu, Daejeon 305-600, Republic of Korea
E-mail:
scho@krict.re.kr
Fax: +82 42-860-7200
Tel: +82 42-860-7260
Novel solution-processable
J. M. Ko, Y. H. Kang, C. Lee and S. Y. Cho, J. Mater. Chem. C, 2013, 1, 3091 DOI: 10.1039/C3TC30297K
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