Issue 6, 2013
From the journal:

Journal of Materials Chemistry C

Soft lithography of graphene sheets via surface energy modification†

Hansun Kim,‡ab   Min-wook Jung,‡ac   Sung Myung,a   Daesung Jung,c   Sun Sook Lee,a   Ki-jeong Kong,a   Jongsun Lim,a   Jong-Heun Lee,b   Chong Yun Parkc  and  Ki-Seok An*a  

* Corresponding authors

a Thin Film Materials Research Group, Korea Research Institute of Chemical Technology, Daejeon 305-543, South Korea
E-mail: ksan@krict.re.kr

b Department of Materials Engineering, Korea University, Seoul 136-713, South Korea

c Department of Physics, Sungkyunkwan University, Suwon 220-746, South Korea

Abstract

A simple and efficient soft lithographic process for an easily applicable patterning method for large-scale graphene sheets was demonstrated. The surface of an elastomeric stamp was functionalized with polar molecules to enhance the interfacial adhesive force between the stamp and the graphene layer. A specific graphene area was then patterned on the initial substrate and transferred to the target surface by contacting with the stamp.

Graphical abstract: Soft lithography of graphene sheets via surface energy modification

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Article information

DOI
https://doi.org/10.1039/C2TC00472K
Article type
Communication
Submitted
23 Oct 2012
Accepted
07 Dec 2012
First published
07 Dec 2012

J. Mater. Chem. C, 2013,1, 1076-1079

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Soft lithography of graphene sheets via surface energy modification

H. Kim, M. Jung, S. Myung, D. Jung, S. S. Lee, K. Kong, J. Lim, J. Lee, C. Y. Park and K. An, J. Mater. Chem. C, 2013, 1, 1076 DOI: 10.1039/C2TC00472K

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