Issue 1, 2013
From the journal:

Journal of Materials Chemistry A

Freestanding silicon films formed on ionic liquid surfaces†

Shimin Cheng,ab   Linyan Hu,a   Wei Qin,ab   Fengqiang Xiongab  and  Can Li*a  

* Corresponding authors

a State Key Laboratory of Catalysis, Dalian Institute of Chemical Physics, Chinese Academy of Sciences and Dalian National Laboratory for Clean Energy, Dalian 116023, China
E-mail: canli@dicp.ac.cn
Web: http://www.canli.dicp.ac.cn
Fax: +86 411 84694447
Tel: +86 411 84379070

b Graduate University of Chinese Academy of Sciences, Beijing 100049, China

Abstract

Freestanding silicon films with a thickness ranging from 1 nm to several micrometers were prepared by Cat-CVD onto ionic liquid ([BMIM][BF4]) surfaces for the first time. The films, obtained without a solid substrate, can be facilely characterized by TEM and AFM to study the film formation and growth process.

Graphical abstract: Freestanding silicon films formed on ionic liquid surfaces

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Article information

DOI
https://doi.org/10.1039/C2TA00503D
Article type
Communication
Submitted
30 Sep 2012
Accepted
01 Nov 2012
First published
02 Nov 2012

J. Mater. Chem. A, 2013,1, 55-58

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Freestanding silicon films formed on ionic liquid surfaces

S. Cheng, L. Hu, W. Qin, F. Xiong and C. Li, J. Mater. Chem. A, 2013, 1, 55 DOI: 10.1039/C2TA00503D

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