Directed self-assembly of block copolymers for universal nanopatterning
Abstract
* Corresponding authors
a
Center for Nanomaterials and Chemical Reactions, Institute for Basic Science (IBS), Department of Materials Science and Engineering, KAIST, Daejeon, Republic of Korea
E-mail:
sangouk.kim@kaist.ac.kr
Fax: +82 42 350 3310
Tel: +82 42 350 3339
B. H. Kim, J. Y. Kim and S. O. Kim, Soft Matter, 2013, 9, 2780 DOI: 10.1039/C2SM27535J
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