Calix[4]resorcinarene was functionalized by photoactive 2-diazo-1-naphthoquinone-4-sulfonyl chloride (2,1,4-DNQ-Cl) to form a single-component non-chemically amplified i-line molecular glass photoresist. This single-component molecular glass photoresist afforded clean 100 nm line patterns with i-line interference lithography.
J. Liu, Q. Wei and L. Wang, RSC Adv., 2013, 3, 25666 DOI: 10.1039/C3RA45130E
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