Layer-by-layer thinning of MoS2 by thermal annealing
Abstract
By thermal
* Corresponding authors
a
Division of Physics and Applied Physics, School of Physical and Mathematical Sciences, Nanyang Technological University, Singapore 637371
E-mail:
Qihua@ntu.edu.sg
b NOVITAS, Nanoelectronics Centre of Excellence, School of Electrical and Electronic Engineering, Nanyang Technological University, Singapore 639798
By thermal
X. Lu, M. I. B. Utama, J. Zhang, Y. Zhao and Q. Xiong, Nanoscale, 2013, 5, 8904 DOI: 10.1039/C3NR03101B
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