Issue 22, 2013

Contamination of PDMS microchannels by lithographic molds

Abstract

By use of synchrotron X-ray fluorescence and Rutherford backscattering spectrometry, we show the SU-8 soft lithographic process contaminates PDMS. Residues of the antimony containing photoinitiator are transferred from the master mold to the surface of PDMS, uncontrollably intensifying the surface potential, leading to electroosmotic flow variability in PDMS microfluidic devices.

Graphical abstract: Contamination of PDMS microchannels by lithographic molds

Supplementary files

Article information

Article type
Communication
Submitted
27 May 2013
Accepted
05 Sep 2013
First published
05 Sep 2013

Lab Chip, 2013,13, 4312-4316

Contamination of PDMS microchannels by lithographic molds

A. J. Bubendorfer, B. Ingham, J. V. Kennedy and W. M. Arnold, Lab Chip, 2013, 13, 4312 DOI: 10.1039/C3LC50641J

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