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Issue 2, 2013
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Highly photoactive Ti-doped α-Fe2O3 thin film electrodes: resurrection of the dead layer

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Abstract

Uniform thin films of hematite and Ti-doped hematite (α-Fe2O3) were deposited on transparent conductive substrates using atomic layer deposition (ALD). ALD's epitaxial growth mechanism allowed the control of the morphology and thickness of the hematite films as well as the concentration and distribution of Ti atoms. The photoelectrochemical performances of Ti-doped and undoped hematite electrodes were examined and compared under water oxidation conditions. The incorporation of Ti atoms into hematite electrodes was found to dramatically enhance the water oxidation performance, with much greater enhancement found for the thinnest films. An optimum concentration ∼3 atomic% of Ti atoms was also determined. A series of electrochemical, photoelectrochemical and impedance spectroscopy measurements were employed to elucidate the cause of the improved photoactivity of the Ti-doped hematite thin films. This performance enhancement was a combination of improved bulk properties (hole collection length) and surface properties (water oxidation efficiency). The improvement in both bulk and surface properties is attributed to the resurrection of a dead layer by the Ti dopant atoms.

Graphical abstract: Highly photoactive Ti-doped α-Fe2O3 thin film electrodes: resurrection of the dead layer

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Article information


Submitted
26 Sep 2012
Accepted
10 Dec 2012
First published
10 Dec 2012

Energy Environ. Sci., 2013,6, 634-642
Article type
Paper

Highly photoactive Ti-doped α-Fe2O3 thin film electrodes: resurrection of the dead layer

O. Zandi, B. M. Klahr and T. W. Hamann, Energy Environ. Sci., 2013, 6, 634
DOI: 10.1039/C2EE23620F

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