On the effect of Au2+ ion irradiation in an amorphous Fe–Si thin layer synthesized by ion implantation: a high resolution X-ray diffraction study
Abstract
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3) four-beam case was tailored and showed in a single ω:phi mapping, through the (1-13) coherent hybrid reflection, all previously detected effects of the Au-irradiation in the Si lattice. It is the first observation of this kind of hybrid reflection in an ion implanted and irradiated Si substrate. From the incidence (ω) and azimuthal (ϕ) angular positions measured, the Si-distorted region lattice parameters were determined along the in-plane and out-of-plane directions.
- This article is part of the themed collection: Crystallisation: From Fundamentals to Application