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Issue 94, 2013
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A novel photodegradable hyperbranched polymeric photoresist

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Abstract

We report the first synthesis of a photodegradable hyperbranched polyacetal, wherein every repeat unit carries a photo-labile 2-nitrobenzyloxy moiety. The pristine HBP serves as a positive photoresist to create micron-size patterns; furthermore, by changing the terminal groups to dipropargyl acetal, clickable photo-patterned substrates can be generated.

Graphical abstract: A novel photodegradable hyperbranched polymeric photoresist

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Publication details

The article was received on 14 Sep 2013, accepted on 07 Oct 2013 and first published on 08 Oct 2013


Article type: Communication
DOI: 10.1039/C3CC47048B
Citation: Chem. Commun., 2013,49, 11041-11043

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    A novel photodegradable hyperbranched polymeric photoresist

    S. Chatterjee and S. Ramakrishnan, Chem. Commun., 2013, 49, 11041
    DOI: 10.1039/C3CC47048B

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