Jump to main content
Jump to site search
PLANNED MAINTENANCE Close the message box

Scheduled maintenance work on Wednesday 22nd May 2019 from 11:00 AM to 1:00 PM (GMT).

During this time our website performance may be temporarily affected. We apologise for any inconvenience this might cause and thank you for your patience.

Issue 94, 2013
Previous Article Next Article

A novel photodegradable hyperbranched polymeric photoresist

Author affiliations


We report the first synthesis of a photodegradable hyperbranched polyacetal, wherein every repeat unit carries a photo-labile 2-nitrobenzyloxy moiety. The pristine HBP serves as a positive photoresist to create micron-size patterns; furthermore, by changing the terminal groups to dipropargyl acetal, clickable photo-patterned substrates can be generated.

Graphical abstract: A novel photodegradable hyperbranched polymeric photoresist

Back to tab navigation

Supplementary files

Publication details

The article was received on 14 Sep 2013, accepted on 07 Oct 2013 and first published on 08 Oct 2013

Article type: Communication
DOI: 10.1039/C3CC47048B
Chem. Commun., 2013,49, 11041-11043

  •   Request permissions

    A novel photodegradable hyperbranched polymeric photoresist

    S. Chatterjee and S. Ramakrishnan, Chem. Commun., 2013, 49, 11041
    DOI: 10.1039/C3CC47048B

Search articles by author