“In situ” hard mask materials: a new methodology for creation of vertical silicon nanopillar and nanowire arrays
Abstract
A novel, simple and in situ hard mask technology that can be used to develop high aspect ratio silicon nanopillar and
* Corresponding authors
a
Materials research group, Department of Chemistry and Tyndall National Institute, University College Cork, Cork, Ireland
E-mail:
m.morris@ucc.ie
Fax: +353 21 427 4097
Tel: +353 21 490 2180
b Centre for Research on Adaptive Nanostructures and Nanodevices (CRANN), Trinity College Dublin, Dublin, Ireland
c Intel Ireland Ltd., Collinstown Industrial Estate, Co. Kildare, Ireland
A novel, simple and in situ hard mask technology that can be used to develop high aspect ratio silicon nanopillar and
If you are not the author of this article and you wish to reproduce material from it in a third party non-RSC publication you must formally request permission using Copyright Clearance Center. Go to our Instructions for using Copyright Clearance Center page for details.
Authors contributing to RSC publications (journal articles, books or book chapters) do not need to formally request permission to reproduce material contained in this article provided that the correct acknowledgement is given with the reproduced material.
Reproduced material should be attributed as follows:
If the material has been adapted instead of reproduced from the original RSC publication "Reproduced from" can be substituted with "Adapted from".
In all cases the Ref. XX is the XXth reference in the list of references.
If you are the author of this article you do not need to formally request permission to reproduce figures, diagrams etc. contained in this article in third party publications or in a thesis or dissertation provided that the correct acknowledgement is given with the reproduced material.
Reproduced material should be attributed as follows:
If you are the author of this article you still need to obtain permission to reproduce the whole article in a third party publication with the exception of reproduction of the whole article in a thesis or dissertation.
Information about reproducing material from RSC articles with different licences is available on our Permission Requests page.
Fetching data from CrossRef.
This may take some time to load.