Wafer-scale MoS2 thin layers prepared by MoO3 sulfurization
Abstract
Atomically thin
* Corresponding authors
a
Institute of Atomic and Molecular Sciences, Academia Sinica, Taipei, Taiwan
E-mail:
lanceli@gate.sinica.edu.tw
b Department of Photonics, National Chiao Tung University, HsinChu 300, Taiwan
c Department of Physics, National Taiwan University, Taipei 106, Taiwan
d Research Center for Applied Sciences, Academia Sinica, Taipei, Taiwan
e Department of Physics, National Tsing Hua University, HsinChu 300, Taiwan
Atomically thin
The article was received on 12 Jul 2012, accepted on 26 Aug 2012 and first published on 29 Aug 2012
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