Issue 29, 2012
From the journal:

Journal of Materials Chemistry

Hydrogen as an optimum reducing agent for metallization of self-assembled monolayers†

Mutlu I. Muglali,*a   Asif Bashir,a   Alexander Birknerb  and  Micheal Rohwerder*a  

* Corresponding authors

a Max-Planck-Institute für Eisenforschung GmbH, D-40237 Düsseldorf, Germany
E-mail: m.rohwerder@mpie.de

b Physical Chemistry I, Ruhr-University Bochum, D-44780 Bochum, Germany

Abstract

We demonstrate a very efficient route for electroless deposition of Pd nanoparticles on self-assembled monolayers (SAMs) of a pyridine-terminated thiol. This method involves reduction of the coordinated Pd2+ on SAMs by exposure to molecular hydrogen. A complete Pd adlayer surface coverage can be obtained. Moreover, this work is the first experimental demonstration of hydrogen adsorption on Pd adlayers.

Graphical abstract: Hydrogen as an optimum reducing agent for metallization of self-assembled monolayers

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Article information

DOI
https://doi.org/10.1039/C2JM32111D
Article type
Communication
Submitted
04 Apr 2012
Accepted
23 May 2012
First published
24 May 2012

J. Mater. Chem., 2012,22, 14337-14340

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Hydrogen as an optimum reducing agent for metallization of self-assembled monolayers

M. I. Muglali, A. Bashir, A. Birkner and M. Rohwerder, J. Mater. Chem., 2012, 22, 14337 DOI: 10.1039/C2JM32111D

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