Environmentally friendly patterning of thin films in linear methyl siloxanes†
Abstract
A number of green
* Corresponding authors
a
Department of Materials Science and Engineering, Cornell University, Ithaca, NY, USA
E-mail:
cko3@cornell.edu
Fax: +1 607 255 2365
b
Department of Polymer Science and Engineering, Inha University, Incheon 402-751, South Korea
E-mail:
jkl36@inha.ac.kr
c Department of Chemistry and Chemical Biology, Cornell University, Ithaca, NY, USA
A number of green
C. Y. Ouyang, J. Lee, M. E. Krysak, J. Sha and C. K. Ober, J. Mater. Chem., 2012, 22, 5746 DOI: 10.1039/C2JM16603H
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