Issue 46, 2012

Fabrication of n-type ZnO nanowire/graphene/p-type silicon hybrid structures and electrical properties of heterojunctions

Abstract

Compared to the p–n junction type device (Device A) with an n-type ZnO nanowire (n-ZnO)/p-type silicon (p-Si) hybrid structure, the newly designed device (Device B) with an n-ZnO/reduced graphene oxide sheet (rGO)/p-Si hybrid structure displays interesting electrical characteristics such as lower turn-on voltage and better current symmetry. The addition of rGO between n-ZnO and the p-Si substrate enables tuning of the p–n junctions into back-to-back Schottky junctions and lowering of the turn-on voltages, implying great potential applications in electronic and optoelectronic devices. The electrical characteristics and operating mechanism of these two devices are fully discussed.

Graphical abstract: Fabrication of n-type ZnO nanowire/graphene/p-type silicon hybrid structures and electrical properties of heterojunctions

Article information

Article type
Paper
Submitted
30 Sep 2012
Accepted
15 Oct 2012
First published
16 Oct 2012

Phys. Chem. Chem. Phys., 2012,14, 16111-16114

Fabrication of n-type ZnO nanowire/graphene/p-type silicon hybrid structures and electrical properties of heterojunctions

Z. Liang, X. Cai, S. Tan, P. Yang, L. Zhang, X. Yu, K. Chen, H. Zhu, P. Liu and W. Mai, Phys. Chem. Chem. Phys., 2012, 14, 16111 DOI: 10.1039/C2CP43453A

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