Exceptionally strong Bragg diffraction from a mesoporous silica film is achieved by exposing the as-deposited film to vapor of chlorotrimethylsilane (Me3SiCl) before extracting the surfactant. The intensity of the X-ray diffraction peak increased 7 times after the surfactant removal and it approached 30% reflectivity. This large increase of diffraction intensity cannot be explained simply by the improved contrast of the electron density, and rearrangement of the pore wall during the Me3SiCl vapor treatment is suggested. It is shown by infrared spectroscopy that Me3SiCl with a high grafting reactivity effectively caps the silanol groups and prevents the following condensation, which causes the structural degradation. The substitution of the hydrogen atom of hydroxyl groups with trimethylsilyl groups should help the improvement of the structural regularity by reducing the hydrogen bonds in the pore wall. The achieved strong diffraction opens the gate for the application of these regular mesoporous films prepared by a self-assembly process to optical elements in the X-ray region.