Issue 4, 2011

A novel lift-off method for fabricating patterned and vertically-aligned W18O49nanowire arrays with good field emission performance

Abstract

A novel lift-off method has been developed for fabricating patterned W18O49 nanowires in vertical arrays and on a large scale. These W18O49 nanowire arrays have an average diameter of about 30 nm, and their lengths range from 2–3 μm. In every pattern of a 2 inch sample, the nanowires exhibit the same morphology and growth density. They are single crystals with monoclinic structure and grow along the [010] direction. Field emission (FE) measurements show that they have a turn-on field of 6.2 V μm−1 and their emission current density can reach 500 μA cm−2 at an electric field of 10.9 V μm−1. Because the W18O49 nanowire patterns synthesized by this simple method still have good FE performance, comparable to many cathode nanostructures with excellent FE properties, it suggests that it may provide an effective and simple preparation technique for patterned growth of nanowire arrays in future FE applications.

Graphical abstract: A novel lift-off method for fabricating patterned and vertically-aligned W18O49 nanowire arrays with good field emission performance

Article information

Article type
Paper
Submitted
20 Dec 2010
Accepted
07 Feb 2011
First published
07 Mar 2011

Nanoscale, 2011,3, 1850-1854

A novel lift-off method for fabricating patterned and vertically-aligned W18O49 nanowire arrays with good field emission performance

F. Liu, F. Y. Mo, S. Y. Jin, L. Li, Z. S. Chen, R. Sun, J. Chen, S. Z. Deng and N. S. Xu, Nanoscale, 2011, 3, 1850 DOI: 10.1039/C0NR01007C

To request permission to reproduce material from this article, please go to the Copyright Clearance Center request page.

If you are an author contributing to an RSC publication, you do not need to request permission provided correct acknowledgement is given.

If you are the author of this article, you do not need to request permission to reproduce figures and diagrams provided correct acknowledgement is given. If you want to reproduce the whole article in a third-party publication (excluding your thesis/dissertation for which permission is not required) please go to the Copyright Clearance Center request page.

Read more about how to correctly acknowledge RSC content.

Social activity

Spotlight

Advertisements