Morphological impact of zinc oxide layers on the device performance in thin-film transistors†
Abstract
* Corresponding authors
a
Organic Materials & Devices (OMD), Dept. of Materials Science, University Erlangen-Nürnberg, Martensstraße 07, Erlangen, Germany
E-mail:
hendrik.faber@ww.uni-erlangen.de
b
Institute of Particle Technology, Dept. of Chemical and Biological Engineering, University Erlangen-Nürnberg, Cauerstraße 04, Erlangen, Germany
E-mail:
w.peukert@lfg.uni-erlangen.de
c
Center for Nanoanalysis and Electron Microscopy (CENEM), Dept. of Materials Science, University Erlangen-Nürnberg, Cauerstraße 06, Erlangen, Germany
E-mail:
erdmann.spiecker@ww.uni-erlangen.de
H. Faber, M. Klaumünzer, M. Voigt, D. Galli, B. F. Vieweg, W. Peukert, E. Spiecker and M. Halik, Nanoscale, 2011, 3, 897 DOI: 10.1039/C0NR00800A
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